Preparation of zinc tin oxide films by reactive magnetron sputtering of Zn on liquid Sn

Zn is sputter-deposited on melted Sn films by radio-frequency magnetron sputtering in oxidizing plasma. The samples present an absorption cut-off wavelength close to the one of ZnO, and an optical transparency higher than 50% in the visible range. Ex-situ thermal annealing improves visible transpare...

Full description

Saved in:
Bibliographic Details
Published inThin solid films Vol. 518; no. 23; pp. 6752 - 6755
Main Authors Pau, J.L., Scheffler, L., Hernández, M.J., Cervera, M., Piqueras, J.
Format Journal Article
LanguageEnglish
Published Amsterdam Elsevier B.V 30.09.2010
Elsevier
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:Zn is sputter-deposited on melted Sn films by radio-frequency magnetron sputtering in oxidizing plasma. The samples present an absorption cut-off wavelength close to the one of ZnO, and an optical transparency higher than 50% in the visible range. Ex-situ thermal annealing improves visible transparency and produces a slight blue-shift in the optical bandgap. X-ray diffraction patterns show typical spectra due to polycrystalline ZnO with evidence of the presence of crystalline SnO, before annealing, and Zn 2SnO 4, after annealing. Rutherford Backscattering studies reveal the existence of a ZnO layer on top of an O-rich (Zn, Sn)O thin film. After optimal thermal treatment, electrical characterization exhibits carrier concentrations of 10 16–10 17 cm − 3 and mobilities of 20–80 cm 2 V − 1 s − 1 for the resulting (Zn, Sn)O n-type films.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2010.06.006