Study of Copper Nitride Thin Film Structure

X-ray diffraction and x-ray absorption spectroscopy at the Cu K-edge were used to study the atomic structure in copper nitride (Cu N) thin films. Textured nanocrystalline films are obtained upon dc magnetron sputtering on substrates heated at about 190 °C, whereas amorphous films having strongly dis...

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Bibliographic Details
Published inLatvian journal of physics and technical sciences Vol. 53; no. 2; pp. 31 - 37
Main Authors Kuzmin, A., Kalinko, A., Anspoks, A., Timoshenko, J., Kalendarev, R.
Format Journal Article
LanguageEnglish
Published Riga De Gruyter Open 01.04.2016
De Gruyter Poland
Subjects
copper nitride
thin film
x-ray absorption spectroscopy
x-ray diffraction
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Summary:X-ray diffraction and x-ray absorption spectroscopy at the Cu K-edge were used to study the atomic structure in copper nitride (Cu N) thin films. Textured nanocrystalline films are obtained upon dc magnetron sputtering on substrates heated at about 190 °C, whereas amorphous films having strongly disordered structure already in the second coordination shell of copper are deposited in the absence of heating.
ISSN:0868-8257
2199-6156
0868-8257
DOI:10.1515/lpts-2016-0011