The mechanical stresses in the molybdenum films formed by magnetron sputtering on a sitall substrate

• Published in: Journal of physics. Conference series Vol. 1260; no. 6; pp. 62023 - 62027
• Main Authors: Strunin, V I, Zeema, V N, Chirikov, N A, Kozlov, A G
• Format: Journal Article
• Language: English
• Published: Bristol IOP Publishing 01.08.2019
• Subjects: Argon; Magnetron sputtering; Molybdenum; Physics; Substrates; Vacuum chambers

The results of investigations of mechanical stress in molybdenum films formed by magnetron sputtering at a constant current when the pressure of the argon in the vacuum chamber of less than 0.13 Pa are presented. It is shown that the magnitude of mechanical stress in Mo films depends on substrate te...