The mechanical stresses in the molybdenum films formed by magnetron sputtering on a sitall substrate

The results of investigations of mechanical stress in molybdenum films formed by magnetron sputtering at a constant current when the pressure of the argon in the vacuum chamber of less than 0.13 Pa are presented. It is shown that the magnitude of mechanical stress in Mo films depends on substrate te...

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Published inJournal of physics. Conference series Vol. 1260; no. 6; pp. 62023 - 62027
Main Authors Strunin, V I, Zeema, V N, Chirikov, N A, Kozlov, A G
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.08.2019
Subjects
Argon
Magnetron sputtering
Molybdenum
Physics
Substrates
Vacuum chambers
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Summary:The results of investigations of mechanical stress in molybdenum films formed by magnetron sputtering at a constant current when the pressure of the argon in the vacuum chamber of less than 0.13 Pa are presented. It is shown that the magnitude of mechanical stress in Mo films depends on substrate temperature, power on the target and argon gas in a vacuum chamber. The minimum value of the mechanical stress in the Mo films were (13-15) · 10−8 H/M2 when they were formed at a power on a target less than 700 W, the flow of argon 6-9 sccm, the substrate temperature (550-620) K and a pressure of argon in the vacuum chamber is 0.07 Pa.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/1260/6/062023