Low-temperature preparation and properties of spinel-type iron oxide films by ECR plasma-enhanced metalorganic chemical vapor deposition

• Published in: Japanese Journal of Applied Physics Vol. 32; no. 10B; pp. L1527 - L1529
• Main Authors: FUJII, E, TORII, H
• Format: Journal Article
• Language: English
• Published: Tokyo Japanese journal of applied physics 01.10.1993
• Subjects: Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Exact sciences and technology; Magnetic properties and materials; Magnetic properties of monolayers and thin films; Magnetic properties of surface, thin films and multilayers; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Crystal growth; Plasma; Inorganic compounds; Magnetization; Electron cyclotron-resonance; Organometallic compounds; Transition element compounds; Binary compounds; Experimental study; CVD; Characterization; Spinels; Iron oxides; Microstructure
• ISSN: 0021-4922; 1347-4065
• DOI: 10.1143/jjap.32.l1527

Spinel-type iron oxide films (Fe 3 O 4 ) have been prepared on soda-lime glass substrates by ECR plasma-enhanced Metalorganic Chemical Vapor Deposition (MOCVD) using Iron (III) acetylacetonato complex [Fe(C 5 H 7 O 2 ) 3 ] or ferrocene [Fe(C 5 H 5 ) 2 ] as the source material. The X-ray diffraction pattern, Auger spectrum and conversion electron Mössbauer spectrum indicated that high-crystallinity and carbon-free Fe 3 O 4 film was obtained at a low temperature of 150°C using ferrocene as the soruce material. SEM images showed that the film had a smooth surface and a columnar structure. Magnetization curves measured by VSM indicated that the film had no definite magnetic anisotropy.