Fabrication, characterization and modeling of single-crystal thin film calorimeter sensors

Thin film based nanocalorimetry is a powerful tool to investigate nanosystems from a thermal point of view. However, nanocalorimetry is usually limited to amorphous or polycrystalline samples. Here we present a device that allows carrying out experiments on monocrystalline silicon. The monocrystalli...

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Published inThermochimica acta Vol. 510; no. 1; pp. 126 - 136
Main Authors Anahory, Y., Guihard, M., Smeets, D., Karmouch, R., Schiettekatte, F., Vasseur, P., Desjardins, P., Hu, Liang, Allen, L.H., Leon-Gutierrez, E., Rodriguez-Viejo, J.
Format Journal Article
LanguageEnglish
Dutch
Published Oxford Elsevier B.V 20.10.2010
Elsevier
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Summary:Thin film based nanocalorimetry is a powerful tool to investigate nanosystems from a thermal point of view. However, nanocalorimetry is usually limited to amorphous or polycrystalline samples. Here we present a device that allows carrying out experiments on monocrystalline silicon. The monocrystalline silicon layer consists of the device layer from a silicon-on-insulator wafer and lies on a low-stress free-standing silicon nitride membrane. We applied a number of characterization techniques to determine the purity and quality of the silicon layer. All these techniques showed that the silicon surface is as pure as a standard silicon wafer and that it is susceptible to standard surface cleaning procedures. Additionally, we present a numerical model of the nanocalorimeter, which highlights that the silicon layer acts as a thermal plate thereby significantly improving thermal uniformity. This nanocalorimeter constitutes a promising device for the study of single-crystal Si surface processes and opens up an exciting new field of research in surface science.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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ISSN:0040-6031
1872-762X
DOI:10.1016/j.tca.2010.07.006