Fabrication, characterization and modeling of single-crystal thin film calorimeter sensors
Thin film based nanocalorimetry is a powerful tool to investigate nanosystems from a thermal point of view. However, nanocalorimetry is usually limited to amorphous or polycrystalline samples. Here we present a device that allows carrying out experiments on monocrystalline silicon. The monocrystalli...
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Published in | Thermochimica acta Vol. 510; no. 1; pp. 126 - 136 |
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Main Authors | , , , , , , , , , , |
Format | Journal Article |
Language | English Dutch |
Published |
Oxford
Elsevier B.V
20.10.2010
Elsevier |
Subjects | |
Online Access | Get full text |
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Summary: | Thin film based nanocalorimetry is a powerful tool to investigate nanosystems from a thermal point of view. However, nanocalorimetry is usually limited to amorphous or polycrystalline samples. Here we present a device that allows carrying out experiments on monocrystalline silicon. The monocrystalline silicon layer consists of the device layer from a silicon-on-insulator wafer and lies on a low-stress free-standing silicon nitride membrane. We applied a number of characterization techniques to determine the purity and quality of the silicon layer. All these techniques showed that the silicon surface is as pure as a standard silicon wafer and that it is susceptible to standard surface cleaning procedures. Additionally, we present a numerical model of the nanocalorimeter, which highlights that the silicon layer acts as a thermal plate thereby significantly improving thermal uniformity. This nanocalorimeter constitutes a promising device for the study of single-crystal Si surface processes and opens up an exciting new field of research in surface science. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0040-6031 1872-762X |
DOI: | 10.1016/j.tca.2010.07.006 |