193 nm ArF laser ablation and patterning of chitosan thin films
This paper reports laser ablation studies on spin-coated biopolymer chitosan films, β-l,4-1inked 2-amino-2-deoxy- d -glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of F T = 85±8 mJ cm −2 has been determined from etch rate measurements. Laser...
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Published in | Applied physics. A, Materials science & processing Vol. 124; no. 6; pp. 1 - 10 |
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Main Authors | , |
Format | Journal Article |
Language | English |
Published |
Berlin/Heidelberg
Springer Berlin Heidelberg
01.06.2018
Springer Nature B.V |
Subjects | |
Online Access | Get full text |
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Summary: | This paper reports laser ablation studies on spin-coated biopolymer chitosan films, β-l,4-1inked 2-amino-2-deoxy-
d
-glucopyranose. Chitosan has been irradiated using an ArF laser emitting at 193 nm. An ablation threshold of
F
T
= 85±8 mJ cm
−2
has been determined from etch rate measurements. Laser-ablated chitosan is characterised using white light interferometry, scanning electron microscopy, and thermo-gravimetric analysis. Laser ablation of chitosan is discussed in terms of thermal and photoacoustic mechanisms. Heat transfer is simulated to assist in the understanding of laser-irradiated chitosan using a finite-element method and the software package COMSOL Multi-Physics™. As a demonstrator, a micro-array of square structures in the form of a crossed grating has been fabricated by laser ablation using a mask projection scanning method. The initial investigations show no evidence of thermal damage occurring to the adjacent chitosan when operating at a moderately low laser fluence of 110 mJ cm
−2
. |
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ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-018-1859-z |