Development of a very large-area ultraviolet imprint lithography process

• Published in: Microelectronic engineering Vol. 86; no. 10; pp. 1983 - 1988
• Main Authors: Kim, Ki-don, Jeong, Jun-ho, Park, Sang-hu, Choi, Dae-geun, Choi, Jun-hyuk, Lee, Eung-sug
• Format: Journal Article
• Language: English
• Published: Amsterdam Elsevier B.V 01.10.2009; Elsevier
• Subjects: Applied sciences; Auto release; Electronics; Exact sciences and technology; Hard stamp; Microelectronic fabrication (materials and surfaces technology); Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Ultraviolet imprint process; Vacuum environment; Vacuum environment; Auto release; Ultraviolet imprint process; Hard stamp; Microelectronic fabrication; Patterning; UV lithography; Numerical method; Photolithography

We propose a very large-area ultraviolet imprint lithography process as a promising alternative to expensive conventional optical lithography for the production of display panels. This process uses a large-area hard stamp in a low vacuum environment. The hard quartz stamp is used to achieve high ove...