Organic Heteroepitaxy: p-Sexiphenyl on Uniaxially Oriented α-Sexithiophene

Organic–organic heteroepitaxy using two rodlike aromatic molecules shows that p‐sexiphenyl aligns predominantly parallel to an underlying uniaxially oriented α‐sexithiophene film (see figure) although there is no lattice match of the two layers. The structure of both layers is determined and the res...

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Published inAdvanced materials (Weinheim) Vol. 18; no. 18; pp. 2466 - 2470
Main Authors Oehzelt, M., Koller, G., Ivanco, J., Berkebile, S., Haber, T., Resel, R., Netzer, F. P., Ramsey, M. G.
Format Journal Article
LanguageEnglish
Published Weinheim WILEY-VCH Verlag 18.09.2006
WILEY‐VCH Verlag
Subjects
Alignment
Epitaxial growth
Heterostructures
Oligothiophenes
Thin films
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Summary:Organic–organic heteroepitaxy using two rodlike aromatic molecules shows that p‐sexiphenyl aligns predominantly parallel to an underlying uniaxially oriented α‐sexithiophene film (see figure) although there is no lattice match of the two layers. The structure of both layers is determined and the results suggest that a simple transfer of the well‐established models of inorganic epitaxy cannot explain the heterostructures formed here.
Bibliography:ArticleID:ADMA200600476
Austrian Science Fund - No. P15624-N08; No. S9708-N09; No. S979-N08
SFB "Electroactive Materials"
ark:/67375/WNG-S7P3X60C-R
This work has been supported by the Austrian Science Fund (FWF) through the projects P15624-N08, S9708-N09, S979-N08, and the SFB "Electroactive Materials". We acknowledge the European Synchrotron Radiation Facility for provision of synchrotron radiation facilities and we thank Gilles Renaud for his assistance in using beamline BM32.
istex:6028ACF2FB6379ABC22473990386328D27823602
This work has been supported by the Austrian Science Fund (FWF) through the projects P15624‐N08, S9708‐N09, S979‐N08, and the SFB “Electroactive Materials”. We acknowledge the European Synchrotron Radiation Facility for provision of synchrotron radiation facilities and we thank Gilles Renaud for his assistance in using beamline BM32.
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ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200600476