A novel method of beryllium window protection in a plasma focus soft X-ray source

• Published in: Japanese Journal of Applied Physics Vol. 31; no. 11; pp. 3695 - 3698
• Main Authors: KATO, Y, OCHIAI, I, SATO, T, MURAYAMA, S, TANIGUCHI, M, FUNATSU, R
• Format: Journal Article
• Language: English
• Published: Tokyo Japanese journal of applied physics 01.11.1992
• Subjects: Exact sciences and technology; Instruments, apparatus, components and techniques common to several branches of physics and astronomy; Physics; X- and γ-ray instruments and techniques; X ray lithography; Plasma focus; Soft X ray; X ray source; Beryllium
• ISSN: 0021-4922; 1347-4065
• DOI: 10.1143/jjap.31.3695

A significant problem of plasma X-ray sources such as a plasma focus device is how to protect the very thin beryllium window from damage and contamination caused by the bombardment of plasma particles. Improvement of the protection of the beryllium window has been made by inserting a magnetic deflector between the focused plasma and the window and by inverting the polarity of the applied voltage to the electrodes. As a result, a 13-µm-thick beryllium membrane can be used safely. The measured X-ray intensity is about 5 mW/cm 2 30 cm from the source operated at 3.5 kJ discharge energy. The achieved intensity is suitable for R&D application in X-ray lithography.