The influence of erbium doping of Al–N sputtered coatings on their optical properties
Room-temperature photoluminescence (PL) measurements were performed on erbium-doped AlN thin films deposited by r.f. reactive magnetron sputtering on steel and amorphous quartz substrates. The Al/(N+Al) ratio in the as-deposited films varies in the range from 0.48 to 0.51, while erbium content range...
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Published in | Thin solid films Vol. 446; no. 2; pp. 264 - 270 |
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Main Authors | , , , , , , |
Format | Journal Article |
Language | English |
Published |
Lausanne
Elsevier B.V
15.01.2004
Elsevier Science |
Subjects | |
Online Access | Get full text |
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Summary: | Room-temperature photoluminescence (PL) measurements were performed on erbium-doped AlN thin films deposited by r.f. reactive magnetron sputtering on steel and amorphous quartz substrates. The Al/(N+Al) ratio in the as-deposited films varies in the range from 0.48 to 0.51, while erbium content ranges from 0.2 to 3.5 at.%. X-ray diffraction showed that the AlN(Er) films with erbium contents up to 1.4 at.% have the hexagonal AlN crystalline structure and a preferential orientation following the [0
0
1] direction. However, as a consequence of lattice distortion and/or defect generation originated by the incorporation of erbium atoms in the AlN structure, the films became amorphous for higher erbium contents. All the as-deposited films exhibited room-temperature PL at 1.54 μm, indicating that at least part of the erbium species are optically active in the as-grown samples. Subsequent annealing of the films led to an intensification of the PL signal up to a factor of 6 for the films heat-treated at 1075 K. Within the range of chemical compositions studied in this work, the PL signal increased with increasing erbium content. A weak green visible PL was also detected for the samples doped with the highest erbium contents when annealed at high temperatures. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0040-6090 1879-2731 |
DOI: | 10.1016/j.tsf.2003.09.055 |