Mass spectroscopy of the ion flux produced during inductively coupled plasma nitriding process

Ion fluxes on the surface of sample embedded in inductively coupled plasma have been studied in conditions typical for titanium alloy nitriding: total pressure 0.44 Pa, Ar/N2 = 70%/30%, and RF power 1500 W. The gas composition was independently monitored by the quadrupole analyser. The ion fluxes we...

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 830; no. 1; pp. 12064 - 12067
Main Authors Kolodko, D V, Kaziev, A V, Ageychenkov, D G, Meshcheryakova, E A, Pisarev, A A, Tumarkin, A V
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 04.05.2017
Subjects
Gas composition
Inductively coupled plasma
Ion flux
Ion nitriding
Magnetic sectors
Mass spectroscopy
Physics
Plasma
Plasma processing
Quadrupoles
Separators
Spectrum analysis
Titanium alloys
Titanium base alloys
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Summary:Ion fluxes on the surface of sample embedded in inductively coupled plasma have been studied in conditions typical for titanium alloy nitriding: total pressure 0.44 Pa, Ar/N2 = 70%/30%, and RF power 1500 W. The gas composition was independently monitored by the quadrupole analyser. The ion fluxes were sampled using a specially designed electrostatic extractor and then analysed with a magnetic sector mass-separator. The extractor design allowed us to apply a bias voltage to the plasma facing electrode thus imitating interaction of ions with the surface during the plasma processing. The ion fluxes of Ar+, N2+, and N+ on the surface were measured. The mass spectroscopy diagnostics unit is suitable for extensive ion content studies in the plasma technology facilities.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/830/1/012064