BN coatings deposition by magnetron sputtering of B and BN targets in electron beam generated plasma

Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 µs for B; 13.56 MHz for BN) at 2-20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition...

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Bibliographic Details
Published inJournal of physics. Conference series Vol. 857; no. 1; pp. 12017 - 12021
Main Authors Kamenetskikh, A S, Gavrilov, N V, Koryakova, O V, Cholakh, S O
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.05.2017
Subjects
Boron nitride
Coatings
Electron beams
Ion current density
Ion currents
Magnetron sputtering
Phase composition
Physics
Substrates
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Summary:Boron nitride coatings were deposited by reactive pulsed magnetron sputtering of B and BN targets (50 kHz, 10 µs for B; 13.56 MHz for BN) at 2-20 mA/cm2 ion current density on the substrate. The effect of electron beam generated plasma on characteristics of magnetron discharge and phase composition of coatings was studied.
ISSN:1742-6588
1742-6596
DOI:10.1088/1742-6596/857/1/012017