Performance of 100-W HVM LPP-EUV source

• Published in: Advanced optical technologies Vol. 4; no. 4; pp. 297 - 309
• Main Authors: Mizoguchi, Hakaru, Nakarai, Hiroaki, Abe, Tamotsu, Nowak, Krzysztof M., Kawasuji, Yasufumi, Tanaka, Hiroshi, Watanabe, Yukio, Hori, Tsukasa, Kodama, Takeshi, Shiraishi, Yutaka, Yanagida, Tatsuya, Soumagne, Georg, Yamada, Tsuyoshi, Yamazaki, Taku, Okazaki, Shinji, Saitou, Takashi
• Format: Journal Article
• Language: English
• Published: Berlin De Gruyter 01.08.2015; Walter de Gruyter GmbH
• Subjects: 13.5 nm; carbon dioxide (CO; extreme ultraviolet (EUV) light source; high-volume manufacturing (HVM); laser; laser-produced plasma (LPP); lithography; tin (Sn)
• ISSN: 2192-8576; 2192-8584
• DOI: 10.1515/aot-2015-0025

At Gigaphoton Inc., we have developed unique and original technologies for a carbon dioxide laser-produced tin plasma extreme ultraviolet (CO -Sn-LPP EUV) light source, which is the most promising solution for high-power high-volume manufacturing (HVM) EUV lithography at 13.5 nm. Our unique technologies include the combination of a pulsed CO laser with Sn droplets, the application of dual-wavelength laser pulses for Sn droplet conditioning, and subsequent EUV generation and magnetic field mitigation. Theoretical and experimental data have clearly shown the advantage of our proposed strategy. Currently, we are developing the first HVM light source, ‘GL200E’. This HVM light source will provide 250-W EUV power based on a 20-kW level pulsed CO laser. The preparation of a high average-power CO laser (more than 20 kW output power) has been completed in cooperation with Mitsubishi Electric Corporation. Recently, we achieved 140 W at 50 kHz and 50% duty cycle operation as well as 2 h of operation at 100 W of power level. Further improvements are ongoing. We will report the latest status and the challenge to reach stable system operation of more than 100 W at about 4% conversion efficiency with 20-μm droplets and magnetic mitigation.