A metallization scheme for junction-down bonding of high-power semiconductor lasers

High-power semiconductor lasers have found increasing applications in industrial, military, commercial, and consumer products. The thermal management of high-power lasers is critical since the junction temperature rise resulting from large heat fluxes strongly affects the device characteristics, suc...

Full description

Saved in:
Bibliographic Details
Published inIEEE transactions on advanced packaging Vol. 29; no. 3; pp. 533 - 541
Main Authors Xingsheng Liu, Kechang Song, Davis, R.W., Hughes, L.C., Hu, M.H., Chung-En Zah
Format Journal Article
LanguageEnglish
Published Piscataway, NY IEEE 01.08.2006
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Online AccessGet full text

Cover

Loading…
More Information
Summary:High-power semiconductor lasers have found increasing applications in industrial, military, commercial, and consumer products. The thermal management of high-power lasers is critical since the junction temperature rise resulting from large heat fluxes strongly affects the device characteristics, such as wavelength, kink power, threshold current and efficiency, and reliability. The epitaxial-side metallization structure has significant impact on the thermal performance of a junction-down bonded high-power semiconductor laser. In this paper, the influence of the epitaxial-side metal (p-metal) on the thermal behavior of a junction-down mounted GaAs-based high-power single-mode laser is studied using finite-element analysis. It is shown that a metallization structure with thick Au layer can significantly reduce the thermal resistance by distributing the heat flow to wider area laterally, and the thermal resistance of a junction-down bonded laser with thick Au metallization is much less sensitive to the voiding in the die attachment solder interface than a laser with thin Au metallization. A metallization structure of Ti-Pt-thick Au-Ti-Cr-Au is designed and implemented, and the metallurgical stability of this metallization scheme is reported. It was found that, without a diffusion barrier, the thick Au layer in the epi-side metallization would be mostly consumed and form intermetallics with the Sn from the AuSn solder during soldering and thermal aging. The Ti-Pt-thick Au-Ti-Cr-Au metallization scheme prevents the diffusion of Sn into the thick Au layer and preserves the integrity of the metallization system. It is a promising candidate for junction-down bonding of high-power semiconductor lasers for improved thermal management and reliability
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:1521-3323
1557-9980
DOI:10.1109/TADVP.2005.848695