Formation and electrochemical behavior of Al and O plasma-implanted biodegradable Mg-Y-RE alloy
► Ion implantation is adopted to modify the surface of the Mg-Y-RE alloy. ► An Al 2O 3-containing oxide layer is produced by Al and O dual implantation. ► An implanted Al layer as a transition layer is formed between the Al 2O 3 layer and magnesium matrix. ► After ion implantation, the corrosion res...
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Published in | Materials chemistry and physics Vol. 132; no. 1; pp. 187 - 191 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Elsevier B.V
16.01.2012
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Subjects | |
Online Access | Get full text |
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Summary: | ► Ion implantation is adopted to modify the surface of the Mg-Y-RE alloy. ► An Al
2O
3-containing oxide layer is produced by Al and O dual implantation. ► An implanted Al layer as a transition layer is formed between the Al
2O
3 layer and magnesium matrix. ► After ion implantation, the corrosion resistance of Mg-Y-RE alloy is significantly improved.
Mg-Y-RE alloy is potentially useful in biodegradable implants but the fast degradation rate in the physiological environment restrains actual applications. In order to enhance the corrosion resistance, aluminum and oxygen ion implantation is employed to modify the surface of the Mg-Y-RE alloy. X-ray photoelectron spectroscopy (XPS) is conducted to obtain elemental depth profiles and determine chemical state changes. Electrochemical impedance spectroscopy and potentiodynamic polarization are employed to investigate the electrochemical behavior in simulated body fluids (SBF). After polarization, the corroded surface is further studied by scanning electron microscopy (SEM). The results indicate Al and O ion implantation produces an Al
2O
3-containing protection layer which improves the corrosion resistance of Mg-Y-RE alloy. After the surface treatment, localized corrosion becomes the dominant corrosion mechanism instead of general corrosion. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0254-0584 1879-3312 |
DOI: | 10.1016/j.matchemphys.2011.11.028 |