Design of the evaporation source for Au-Ge alloy

The new design of the evaporator is developed in which the material is heated by heat transfer from a plate heated in glow discharge plasma above the surface of a magnetron sputtering source. The evaporator makes it possible to obtain pure films with deposition rates around 1 μm / min, 100% material...

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Bibliographic Details
Published inIOP conference series. Materials Science and Engineering Vol. 387; no. 1; pp. 12050 - 12054
Main Authors Makarova, M V, Moiseev, K M, Nazarenko, A A, Luchnikov, P A
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.07.2018
Subjects
Evaporation
Evaporators
Glow discharges
Magnetron sputtering
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Summary:The new design of the evaporator is developed in which the material is heated by heat transfer from a plate heated in glow discharge plasma above the surface of a magnetron sputtering source. The evaporator makes it possible to obtain pure films with deposition rates around 1 μm / min, 100% material productions, and from 1.5 to 3 times higher material consumption efficiency. The design of the source is very simple and the new one could be made without great cost. This solution can be useful in prototype and small-scale production for the implementation of evaporation process in vacuum coating machines equipped with only magnetron sputtering sources without the use of additional power supplies and without any changes to the control system.
ISSN:1757-8981
1757-899X
DOI:10.1088/1757-899X/387/1/012050