Topological signatures of Mo2TiC2O2

• Published in: AIP advances Vol. 14; no. 3; pp. 035011 - 035011-11
• Main Authors: Parajuli, D., Samatha, K.
• Format: Journal Article
• Language: English
• Published: Melville American Institute of Physics 01.03.2024; AIP Publishing LLC
• Subjects: Ablation; Chemical etching; Chemical potential; Dichroism; Electron energy; Electron spin; Electrons; Energy gap; Gas pressure; Insulation; Oxidation; Photoelectric emission; Pulsed laser deposition; Pulsed lasers; Topology; Trigonometric functions
• ISSN: 2158-3226; 2158-3226
• DOI: 10.1063/5.0196244

Mo2TiC2 is the Ordered Double Transitional Metal Layered Carbides (ODTMLC) derived from its parent MAX phases Mo2TiAlC2 by a wet chemical etching. Its oxidation was done by a new ablated plasma thrust method in which the MXenes were at 750 °C under an oxygen background in the pulsed laser deposition chamber. The reflective high electron energy diffraction technique assures the oxidation at the ambient gas pressure p = 0.1 mbar, which was described in the previous paper. The obtained Mo2TiC2O2 was transferred for their topological test under angle-resolved photoemission spectroscopy, circular dichroism test, and Chemical Potential (CP) analysis. An indirect energy bandgap of 125 meV was obtained. The sine function of α along with period π and β with period 2π shows that there is a possibility of helical spin textures in both α (electron-like pocket around Γ̄) and β (elliptical electron-like pocket around M̄). The CP analysis shows the possibility of at least 100 meV bandgap creation on a single surface so that the surface charges will flow without any effect of bulk. The Mo2TiC2O2 can be used as topological insulating material.