Plasma immersion ion implantation for SOI synthesis : SIMOX and ion-cut

• Published in: Journal of electronic materials Vol. 27; no. 9; pp. 1059 - 1066
• Main Authors: LU, X, SUNDAR KULAR IYER, S, JIN LEE, DOYLE, B, ZHINENG FAN, CHU, P. K, CHENMING HU, CHEUNG, N. W
• Format: Journal Article
• Language: English
• Published: New York, NY Institute of Electrical and Electronics Engineers 01.09.1998; Springer Nature B.V
• Subjects: Applied sciences; Chemical synthesis; Electron micrographs; Electronics; Exact sciences and technology; Finite element method; Fracture mechanics; Fracture toughness; High temperature; Hydrogen plasma; Ideal gas; Internal pressure; Ion implantation; Microelectronic fabrication (materials and surfaces technology); Oxygen plasma; Plasma; Secondary ion mass spectrometry; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices; Separation; Silicon; Silicon dioxide; Silicon substrates; SIMOX (semiconductors); Single crystals; SOI (semiconductors); Submerging; Surface layers; Silicon on insulator technology; Plasma; Microelectronic fabrication; Ion implantation; Oxygen; Fracture mechanics; SIMOX technology; Hydrogen; Silicon; Immersion; Thermal annealing
• ISSN: 0361-5235; 1543-186X
• DOI: 10.1007/s11664-998-0164-6

We have demonstrated feasibility to form silicon-on-insulator (SOI) substrates using plasma immersion ion implantation (PIII) for both separation by implantation of oxygen and ion-cut. This high throughput technique can substantially lower the high cost of SOI substrates due to the simpler implanter design as well as ease of maintenance. For separation by plasma implantation of oxygen wafers, secondary ion mass spectrometry analysis and cross-sectional transmission electron micrographs show continuous buried oxide formation under a single-crystal silicon overlayer with sharp Si/SiO2 interfaces after oxygen plasma implantation and high-temperature (1300°C) annealing. Ion-cut SOI wafer fabrication technique is implemented for the first time using PIII. The hydrogen plasma can be optimized so that only one ion species is dominant in concentration and there are minimal effects by other residual ions on the ion-cut process. The physical mechanism of hydrogen induced silicon surface layer cleavage has been investigated. An ideal gas law model of the microcavity internal pressure combined with a two-dimensional finite element fracture mechanics model is used to approximate the fracture driving force which is sufficient to overcome the silicon fracture resistance.