Influence of CTAB cationic surfactant on codeposition of SiC particles with cobalt

• Published in: Transactions of the Institute of Metal Finishing Vol. 89; no. 1; pp. 33 - 38
• Main Authors: Rudnik, E, Burzyńska, L, Gębka, M
• Format: Journal Article
• Language: English
• Published: Taylor & Francis 01.01.2011
• Subjects: Adsorption; Cationic; Cobalt; Composite; Current efficiency; Deposition; Electrodeposition; Particulate composites; Silicon carbide; Surfactant; Surfactants
• ISSN: 0020-2967; 1745-9192
• DOI: 10.1179/174591910X12835095635187

Electrodeposition of SiC particles in a cobalt matrix in the presence of cetyltrimethylammonium bromide (CTAB) as a cationic surfactant has been carried out. The inhibiting effect of CTAB (0-1·1 mM) on the cathodic process was observed during the establishment of polarisation curves in galvanostatic and potentiodynamic measurements. The surfactant enhanced SiC incorporation into the matrix from ∼5 vol.-% in the absence of CTAB to ∼30 vol.-% at 1·1 mM CTAB for two current densities (0·5 and 1·0 A dm −2 ). The presence of cationic surfactant in the bath decreased the adsorption of Co 2+ ions on SiC, but increased Br − adsorption was simultaneously observed. Current efficiencies were correlated with Co 2+ /Br − molar ratios for the ions adsorbed on the particles. The structure of the composite coatings was studied microscopically. Microhardness of the deposits (200-500 HV) was also determined.