Preparation and photoelectric properties of SnOx films with tunable optical bandgap

• Published in: Chemical physics letters Vol. 739; p. 137039
• Main Authors: Wang, Fang, Jia, Menghan, Tang, Libin, Wang, Chong, Xiang, Jinzhong, Teng, Kar Seng, Lau, Shu Ping
• Format: Journal Article
• Language: English
• Published: Elsevier B.V 01.01.2020
• Subjects: Oxygen partial pressure; SnOx; Tunable optical band gap; Ultraviolet detection; Tunable optical band gap; Ultraviolet detection; Oxygen partial pressure; SnOx
• ISSN: 0009-2614; 1873-4448
• DOI: 10.1016/j.cplett.2019.137039

[Display omitted] •Tunable optical band gap of SnOx films were prepared.•Broad optical absorption bands of SnOx thin films cover UVA, UVB and UVC.•UV photodetectors based on SnOx films were fabricated. SnOx thin films with tunable optical bandgap were prepared using RF magnetron sputtering. The bandgap was adjustable between 2.16 and 3.96 eV depending on oxygen partial pressure during deposition and heat treatment. The structure and properties of the SnOx films were studied. The optical absorption of the SnOx films covered multiple ultraviolet bands, such as UVA, UVB and UVC. A photodetector based on the annealed SnOx film exhibited a detectivity of 1 × 1011 Jones (under 365 nm UV light) at room temperature, which demonstrates the important potential application of SnOx films for UV detection.