An Insight Into the ESD Behavior of the Nanometer-Scale Drain-Extended NMOS Device-Part I: Turn-On Behavior of the Parasitic Bipolar

A second-breakdown phenomenon (It2) in a drain-extended n-type metal-oxide-semiconductor (DENMOS) is associated with complex triggering of a parasitic bipolar transistor. Full comprehension of the problem requires 3-D modeling; however, there is even deficiency in the understanding of the phenomenon...

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Published inIEEE transactions on electron devices Vol. 58; no. 2; pp. 309 - 317
Main Authors Chatterjee, A, Shrivastava, M, Gossner, H, Pendharkar, S, Brewer, F, Duvvury, C
Format Journal Article
LanguageEnglish
Published New York, NY IEEE 01.02.2011
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
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Summary:A second-breakdown phenomenon (It2) in a drain-extended n-type metal-oxide-semiconductor (DENMOS) is associated with complex triggering of a parasitic bipolar transistor. Full comprehension of the problem requires 3-D modeling; however, there is even deficiency in the understanding of the phenomenon occurring in the 2-D cross-sectional plane. We present experiments and models to understand the physics of bipolar turn-on and its impact on the onset of space-charge modulation in a DENMOS device. We present a detailed analysis of the current paths involved during the bipolar turn-on. We show that a strong snapback is triggered due to coupling of the parasitic bipolar turn-on in a deeper region of the p-body and avalanche injection at the drain junction. Furthermore, we show that the ballast resistor formed in the drain region due to current crowding of electrons under high-current conditions can be modeled through a simplified 1-D analysis of the n + /n - resistive structure.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9383
1557-9646
DOI:10.1109/TED.2010.2093010