Submicro-Pattern Generated by Laser Using a Microparticle Mask

This paper studies the submicro-hole generated by laser using a microparticle mask. Laser interaction with a microparticle induces a strong near-field enhancement confined to a very small area, so this enhanced field can be applied to create nanoscale structures on the silicon substrate. In the proc...

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Bibliographic Details
Published inProcedia engineering Vol. 15; pp. 5207 - 5211
Main Authors Ho, C.Y., Zou, J.T., Tsai, Y.H.
Format Journal Article
LanguageEnglish
Published Elsevier Ltd 2011
Subjects
Laser
Mask
Microparticle
Submicrohole
Mask
Microparticle
Submicrohole
Laser
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Summary:This paper studies the submicro-hole generated by laser using a microparticle mask. Laser interaction with a microparticle induces a strong near-field enhancement confined to a very small area, so this enhanced field can be applied to create nanoscale structures on the silicon substrate. In the process of the formation for the nanostructures, initially the silicon substrate is locally melted due to optical field enhancement between the spherical microparticle and the substrate. Then the melt and mushy zones occurs and nanostructures form after solidification. In order to obtain a further understanding for the formation of the nanostructures on the silicon substrate, a heat transfer model is employed to predict the shape and size of the nanoscale fusion zone on the silicon substrate in this proposal. This study calculated the fusion zone induced by the scattering field of laser incident on a microparticle.
ISSN:1877-7058
1877-7058
DOI:10.1016/j.proeng.2011.08.965