Advanced mask aligner lithography (AMALITH) for thick photoresist

Advanced mask aligner lithography (AMALITH) is a holistic approach to improve shadow printing (contact and proximity lithography) in mask aligners. AMALITH is based on two tools, the MO Exposure Optics ® , a new illumination system allow shaping the angular spectrum of the illumination light, and LA...

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Bibliographic Details
Published inMicrosystem technologies Vol. 20; no. 10-11; pp. 1839 - 1842
Main Authors Voelkel, Reinhard, Vogler, Uwe, Bramati, Arianna, Hennemeyer, Marc, Zoberbier, Ralph, Voigt, Anja, Grützner, Gabi, Ünal, Nezih, Hofmann, Ulrich
Format Journal Article Conference Proceeding
LanguageEnglish
Published Berlin/Heidelberg Springer Berlin Heidelberg 01.10.2014
Springer
Subjects
Applied sciences
Cross-disciplinary physics: materials science; rheology
Electronics and Microelectronics
Engineering
Exact sciences and technology
Instrumentation
Materials science
Mechanical Engineering
Mechanical engineering. Machine design
Nanotechnology
Physics
Precision engineering, watch making
Surface treatments
Technical Paper
Mask Pattern
Process Engineer
Illumination Light
Angular Spectrum
Microlens Array
Alignment
Selfcalibration
Lithography
Instrumentation
Illumination
Photoresists
Contact printing
Masks
Light sources
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Summary:Advanced mask aligner lithography (AMALITH) is a holistic approach to improve shadow printing (contact and proximity lithography) in mask aligners. AMALITH is based on two tools, the MO Exposure Optics ® , a new illumination system allow shaping the angular spectrum of the illumination light, and LAB, a software tool for full 3D simulation of the shadow printing process. MO Exposure Optics ® is provided by SUSS MicroTec AG ( http://www.suss.com ), as an upgrade for all current and older mask aligner models. MO Exposure Optics ® decouples the illumination from lamp misplacement (self-calibrated light source), improves the light uniformity, provides telecentric illumination and enables customized illumination in mask aligners. LAB is a software tool provided by GenISys GmbH ( http://www.genisys-gmbh.com ), and allows simulating the complete chain from illumination, mask pattern, photoresist and resist processing. The combination of both tools allows optimizing mask aligner lithography beyond today’s limits.
ISSN:0946-7076
1432-1858
DOI:10.1007/s00542-013-1950-5