Pressure dependence of the resputtering of Y-Ba-Cu-O thin films grown by DC magnetron sputtering

YBa sub(2)Cu sub(3)O sub(6+x) films were grown using DC magnetron sputtering from fully presputtered stoichiometric compound targets. A planar geometry was used with the substrates opposing the target. For deposition at high substrate temperatures the film composition was strongly pressure dependent...

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Published inSuperconductor science & technology Vol. 4; no. 1S; pp. S379 - S381
Main Authors Selinder, T I, Larsson, G, Helmersson, U, Rudner, S
Format Journal Article
LanguageEnglish
Published IOP Publishing 01.01.1991
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Summary:YBa sub(2)Cu sub(3)O sub(6+x) films were grown using DC magnetron sputtering from fully presputtered stoichiometric compound targets. A planar geometry was used with the substrates opposing the target. For deposition at high substrate temperatures the film composition was strongly pressure dependent. Films were stoichiometric when grown at pressures above 9.0 Pa, and at 600 degree C. At lower pressures resputtering by energetic oxygen occurred. The generation of these energetic particles is discussed and a method to avoid deterious bombardment is presented.
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ISSN:0953-2048
1361-6668
DOI:10.1088/0953-2048/4/1S/112