Selective ablation-assisted two-photon stereolithography for effective nano- and microfabrication

The two-photon stereolithography (TPS) process has strong merits for the direct fabrication of 2-D and 3-D microstructures with sub-100-nm resolution. In this paper, we report an effective fabrication process in which selective ablation-assisted TPS (SA-TPS) was used to ameliorate some of the limita...

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Published inApplied physics. A, Materials science & processing Vol. 103; no. 4; pp. 1111 - 1116
Main Authors Lim, Tae Woo, Son, Yong, Yang, Dong-Yol, Kong, Hong-Jin, Lee, Kwang-Sup
Format Journal Article
LanguageEnglish
Published Berlin/Heidelberg Springer-Verlag 01.06.2011
Springer
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Summary:The two-photon stereolithography (TPS) process has strong merits for the direct fabrication of 2-D and 3-D microstructures with sub-100-nm resolution. In this paper, we report an effective fabrication process in which selective ablation-assisted TPS (SA-TPS) was used to ameliorate some of the limitations of the TPS process. In SA-TPS, two processes (namely, an additive process of two-photon induced photocuring and a subtractive process of selective laser ablation) were performed sequentially using a single femtosecond laser optical scanning system. The effectiveness of the proposed process was demonstrated in several applications, including precise high-resolution patterning at resolution levels higher than those achievable using the TPS process, and the fabrication of structures with high mechanical sensitivity.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
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content type line 23
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-010-6051-z