Selective ablation-assisted two-photon stereolithography for effective nano- and microfabrication
The two-photon stereolithography (TPS) process has strong merits for the direct fabrication of 2-D and 3-D microstructures with sub-100-nm resolution. In this paper, we report an effective fabrication process in which selective ablation-assisted TPS (SA-TPS) was used to ameliorate some of the limita...
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Published in | Applied physics. A, Materials science & processing Vol. 103; no. 4; pp. 1111 - 1116 |
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Main Authors | , , , , |
Format | Journal Article |
Language | English |
Published |
Berlin/Heidelberg
Springer-Verlag
01.06.2011
Springer |
Subjects | |
Online Access | Get full text |
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Summary: | The two-photon stereolithography (TPS) process has strong merits for the direct fabrication of 2-D and 3-D microstructures with sub-100-nm resolution. In this paper, we report an effective fabrication process in which selective ablation-assisted TPS (SA-TPS) was used to ameliorate some of the limitations of the TPS process. In SA-TPS, two processes (namely, an additive process of two-photon induced photocuring and a subtractive process of selective laser ablation) were performed sequentially using a single femtosecond laser optical scanning system. The effectiveness of the proposed process was demonstrated in several applications, including precise high-resolution patterning at resolution levels higher than those achievable using the TPS process, and the fabrication of structures with high mechanical sensitivity. |
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Bibliography: | ObjectType-Article-2 SourceType-Scholarly Journals-1 ObjectType-Feature-1 content type line 23 |
ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-010-6051-z |