Plasma irradiation effects in phthalocyanine films

Plasma irradiation effects in copper phthalocyanine films were examined. The film surface and chemical composition were characterized by means of atomic force microscopy (AFM) and secondary ion mass spectrometry (SIMS), including SIMS profiling.

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Bibliographic Details
Published inApplied surface science Vol. 230; no. 1; pp. 241 - 248
Main Authors Pakhomov, G.L, Drozdov, M.N, Vostokov, N.V
Format Journal Article
LanguageEnglish
Published Elsevier B.V 31.05.2004
Subjects
AFM
Dry etching
Heterostructures
Phthalocyanines
SIMS
68.49.Sf
81.07.Pr
Dry etching
61.66.Hq
AFM
SIMS
81.65.Cf
Phthalocyanines
Heterostructures
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Summary:Plasma irradiation effects in copper phthalocyanine films were examined. The film surface and chemical composition were characterized by means of atomic force microscopy (AFM) and secondary ion mass spectrometry (SIMS), including SIMS profiling.
ISSN:0169-4332
1873-5584
DOI:10.1016/j.apsusc.2004.02.043