Well-Defined ABA Triblock Copolymers Containing Carbazole and Ethynyl Groups: Living Anionic Polymerization, Postpolymerization Modification, and Thermal Cross-Linking
A block copolymer that can be thermally cross-linked is synthesized by copolymerization of N -phenyl-2-vinylcarbazole (A) and trimethyl(2-(4-vinylphenyl)ethynyl)silane (B) , followed by a deprotection reaction (d-P BAB ). A triblock copolymer containing carbazole and (trimethylsilyl)ethynyl groups (...
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Published in | Macromolecular research Vol. 29; no. 7; pp. 470 - 476 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
Seoul
The Polymer Society of Korea
01.07.2021
Springer Nature B.V 한국고분자학회 |
Subjects | |
Online Access | Get full text |
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Summary: | A block copolymer that can be thermally cross-linked is synthesized by copolymerization of
N
-phenyl-2-vinylcarbazole
(A)
and trimethyl(2-(4-vinylphenyl)ethynyl)silane
(B)
, followed by a deprotection reaction (d-P
BAB
). A triblock copolymer containing carbazole and (trimethylsilyl)ethynyl groups (P
BAB
) is first prepared using potassium naphthalenide in tetrahyrdofuran at −78 °C for 60 min. Well-controlled poly
(A)
and P
BAB
can be obtained under the conditions employed in this anionic block copolymerization. The well-defined d-P
BAB
with thermally cross-linkable ethynyl group is then prepared by the deprotection of the trimethylsilyl group from P
BAB
without side reactions. The thermal cross-linking behavior of d-P
BAB
is investigated using thermogravimetric analysis and differential scanning calorimetry. The d-P
BAB
is cross-linked under different conditions, and it is observed that the d-P
BAB
film heated at 250 °C for 60 min shows excellent solvent resistance and increased film density. In addition, the highest occupied molecular orbital and lowest unoccupied molecular orbital energy levels of cross-linked d-P
BAB
are estimated to be −5.09 and −1.57 eV, respectively. |
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ISSN: | 1598-5032 2092-7673 |
DOI: | 10.1007/s13233-021-9061-0 |