Deposition of hydroxyapatite thin films by Nd:YAG laser ablation: a microstructural study

Hydroxyapatite (HA) thin films has been successfully deposited by Nd:YAG laser ablation at λ = 532 nm. The morphology and microstructure of the deposited layers was studied by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and high resolution electron microscopy (HREM). P...

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Published inMaterials research bulletin Vol. 39; no. 13; pp. 2089 - 2101
Main Authors Nistor, L.C., Ghica, C., Teodorescu, V.S., Nistor, S.V., Dinescu, M., Matei, D., Frangis, N., Vouroutzis, N., Liutas, C.
Format Journal Article
LanguageEnglish
Published United States Elsevier Ltd 02.11.2004
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Summary:Hydroxyapatite (HA) thin films has been successfully deposited by Nd:YAG laser ablation at λ = 532 nm. The morphology and microstructure of the deposited layers was studied by scanning electron microscopy (SEM), transmission electron microscopy (TEM) and high resolution electron microscopy (HREM). Polycrystalline HA films were directly obtained with the substrate at 300 °C and without introducing water vapors in the deposition chamber. Electron paramagnetic resonance (EPR) measurements show that the oxygen stoichiometry in the HA films is also maintained. Depositions performed at λ = 335 nm laser wavelength and 300 °C substrate temperature resulted in polycrystalline layers of mixed composition of HA and tricalciumphosphate (TCP).
ISSN:0025-5408
1873-4227
DOI:10.1016/j.materresbull.2004.07.006