Effect of the pressure of sputtering atmosphere on the physical properties of amorphous aluminum oxide films

• Published in: Journal of materials science Vol. 35; no. 9; pp. 2193 - 2199
• Main Authors: KIJIMA, Y, HANADA, T
• Format: Journal Article
• Language: English
• Published: Heidelberg Springer 01.05.2000; Springer Nature B.V
• Subjects: Aluminum; Aluminum oxide; Chemical composition; Compressive properties; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Cross-disciplinary physics: materials science; rheology; Density; Deposition by sputtering; Exact sciences and technology; Materials science; Mechanical and acoustical properties; Methods of deposition of films and coatings; film growth and epitaxy; Modulus of elasticity; Optical constants (including refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity); Optical constants: refractive index, complex dielectric constant, absorption, reflection and transmission coefficients, emissivity; Optical properties and condensed-matter spectroscopy and other interactions of matter with particles and radiation; Optical properties of bulk materials and thin films; Organic chemistry; Oxide coatings; Physical properties; Physical properties of thin films, nonelectronic; Physics; Pressure dependence; Pressure effects; Refractivity; Residual stress; Sputtering; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties); Tensile stress; X ray analysis; Inorganic compounds; Pressure effects; Refractive index; Mechanical properties; Amorphous state; Experimental study; Fabrication property relation; Density; Thin films; Young modulus; Internal stresses; Optical properties; Chemical preparation; Chemical composition; Microstructure; Radiofrequency sputtering; Aluminium oxides
• ISSN: 0022-2461; 1573-4803
• DOI: 10.1023/A:1004714623548

Amorphous aluminum oxide films were prepared by rf-sputtering at various values of the pressure of sputtering atmosphere, and their density, refractive index, Young's modulus and internal stress were measured. The physical properties of the present films depended on the pressure of sputtering atmosphere. The density, refractive index, and Young's modulus decreased with the pressure below about 6.5 Pa, beyond which they increased. The compressive stress and tensile stress were induced in the films depending upon the pressure of sputtering atmosphere, and the tensile stress reached a maximum at the pressure of 6.5 Pa and then decreased as the pressure increased. From the results of the energy-dispersive X-ray analysis (EDX), it was found that the pressure of sputtering atmosphere gave a large influence to the chemical composition (the atomic ratio, O/Al) of the film. The pressure dependence of the physical properties was successful to be explained by the change of chemical compositions of the films. The presence of OH group in the films was verified by using FT-IR, and their microstructure was investigated by SEM study.