Programmable self-aligning ferrofluid masks for lithographic applications

A novel self-aligned "soft masking" method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to...

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Bibliographic Details
Published inIEEE transactions on magnetics Vol. 40; no. 4; pp. 2994 - 2996
Main Authors Yellen, B.B., Friedman, G., Barbee, K.A.
Format Journal Article Conference Proceeding
LanguageEnglish
Published New York, NY IEEE 01.07.2004
Institute of Electrical and Electronics Engineers
The Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subjects
Automatic control
Biological materials
Chemicals
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Exact sciences and technology
Iron
Lithography
Magnetic fields
Magnetic levitation
Magnetic properties and materials
Magnetism
Optical materials
Physics
Protection
Resists
maskless lithog raphy
Ferrofluid
photolithography
self-assembly
masking
magnetism
self-aligning
Magnetic materials
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Summary:A novel self-aligned "soft masking" method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic fields applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV and/or chemical exposure.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9464
1941-0069
DOI:10.1109/TMAG.2004.829836