Direct deposition strategy for highly ordered inorganic organic perovskite thin films and their optoelectronic applications
A direct deposition methodology has been optimized for highly crystalline inorganic-organic (IO) perovskite thin films. The simplest deposition ensures long-range order with high c-oriented thin films, thicknesses ranging from ultra-thin (~20nm) and up to 1.5 mu m. These self-assembled layered perov...
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Published in | Optical materials express Vol. 4; no. 7; pp. 1313 - 1323 |
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Main Authors | , , , |
Format | Journal Article |
Language | English |
Published |
01.07.2014
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Subjects | |
Online Access | Get full text |
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Summary: | A direct deposition methodology has been optimized for highly crystalline inorganic-organic (IO) perovskite thin films. The simplest deposition ensures long-range order with high c-oriented thin films, thicknesses ranging from ultra-thin (~20nm) and up to 1.5 mu m. These self-assembled layered perovskites are naturally aligned alternative stacking arrangement of inorganic and organic monolayers, resemble multiple quantum wells (MQWs), which offers superior optoelectronic properties such as room-temperature optical excitons, strong electrically induced photo-carrier mobilities etc. The established fabrication is having device-compatible advantage over other conventional solution-processed thin films wherein the optical features are restricted by thickness limitations (<200nm) and with possible corrugated surface morphologies with multi-phases. The universally acceptable ability has been demonstrated for wide varieties of organic moieties (R) as well as different lead halide networks in type (R-NH sub(3)) sub(2)PbX sub(4) (X = I, Br, Cl). The potential of the direct deposition methodology for demonstrated in 3D template structure fabrication as well as in photocurrent response capability. |
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Bibliography: | ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
ISSN: | 2159-3930 2159-3930 |
DOI: | 10.1364/OME.4.001313 |