Surface pattern recording in Sb2Se3 thin films

• Published in: Journal of non-crystalline solids Vol. 377; pp. 165 - 168
• Main Authors: Shiman, Oksana, Gerbreders, Vjaceslavs, Gerbreders, Andrejs, Kolbjonoks, Vadims
• Format: Journal Article Conference Proceeding
• Language: English
• Published: Oxford Elsevier B.V 01.10.2013; Elsevier
• Subjects: Atomic force microscopy; Condensed matter: electronic structure, electrical, magnetic, and optical properties; Condensed matter: structure, mechanical and thermal properties; Electron beam irradiation; Electrons and positron radiation effects; Exact sciences and technology; Magnetic properties and materials; Magnetic recording materials; Physical radiation effects, radiation damage; Physics; Relief; Structure of solids and liquids; crystallography; Studies of specific magnetic materials; Atomic force microscopy; Electron beam irradiation; Relief; Radiation effects; Irradiation defect; Free volume; Topology; Thin films; Wet process; Electron beams; Electron irradiation; Stress effects; Recording material; Defect formation; Electrostatic force
• ISSN: 0022-3093; 1873-4812
• DOI: 10.1016/j.jnoncrysol.2013.02.031

Results on the modification of Sb2Se3 thin film surface topology by irradiation followed by wet-etching are given. Comparison of study results revealed the possible role of purely electronic and thermal processes in the relief formation. The latter is supposed to be connected with radiation-induced defect creation, free volume increase under the increased fluidity conditions as well as with the possible additional influence of electrostatic forces and stress. Changes in surface characteristics are presented and potential applications of this treatment are discussed. •The surface of Sb–Se thin film has been modified by EB irradiation followed by wet-etching.•The fidelity of patterning and the ability to form grayscale features in Sb2Se3 thin films was established.•The achieved resolution of these resists is 1μm.