The role of stress on silicon dry oxidation kinetics

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Bibliographic Details
Published inSemiconductor science and technology Vol. 4; no. 10; pp. 876 - 878
Main Authors Alexandrova, S, Szekeres, A, Koprinarova, J
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 01.10.1989
Institute of Physics
Subjects
Condensed matter: structure, mechanical and thermal properties
Exact sciences and technology
Mechanical and acoustical properties; adhesion
Physics
Solid surfaces and solid-solid interfaces
Solid-fluid interfaces
Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)
Surface treatment
Semiconductor materials
Thin film
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ISSN:0268-1242
1361-6641
DOI:10.1088/0268-1242/4/10/008