Effects of ozone as an oxygen source on the properties of the Al2O3 thin films prepared by atomic layer deposition

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Bibliographic Details
Published inMaterials chemistry and physics Vol. 78; no. 3; pp. 733 - 738
Main Authors KIM, Jaebum, CHAKRABARTI, Kuntal, LEE, Jinho, OH, Ki-Young, LEE, Chongmu
Format Journal Article
LanguageEnglish
Published Lausanne Elsevier 28.02.2003
Subjects
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Liquid phase epitaxy; deposition from liquid phases (melts, solutions, and surface layers on liquids)
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Thin films
Ultrathin films
RBS
Growth rate
Ozone
XRD
Experimental study
Deposition process
X-ray photoelectron spectra
AES
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ISSN:0254-0584
1879-3312
DOI:10.1016/s0254-0584(02)00375-9