Characteristics of ZnO thin film deposited on various metal bottom electrodes

ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited fil...

Full description

Saved in:
Bibliographic Details
Published inMetals and materials international Vol. 9; no. 4; pp. 383 - 387
Main Authors Jeon, Young Ah, No, Kwang Soo, Kim, Jong Sung, Yoon, Young Soo
Format Journal Article
LanguageEnglish
Published Seoul Springer Nature B.V 01.08.2003
Subjects
Compressive properties
Crystallinity
Deposition
Electrodes
Grain size
Metallurgy
Morphology
Nickel
Platinum
Preferred orientation
Residual stress
Scanning electron microscopy
Silicon dioxide
Texturing
Thin films
Titanium
Zinc oxide
Online AccessGet full text

Cover

More Information
Summary:ZnO films for electronic applications were deposited by radio-frequency (rf) sputtering onto various metal bottom electrodes (Pt/Ti, W, Ni) to investigate such structural properties as crystallinity and surface morphology. The crystallinity, surface morphology and composition of the as-deposited films were studied using X-ray diffraction (XRD), scanning electron microscopy (SEM) and Rutherford back-scattering spectrometry (RBS), respectively. The preferred orientation and surface morphologies were strongly influenced by the type of bottom electrodes. The ZnO films with (200) texturing deposited on Pt/Ti/SiO2/Si showed a smoother and smaller grain size than those deposited on W and Ni. The ZnO films on Pt and W electrodes exhibited compressive residual stress.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ObjectType-Article-1
ObjectType-Feature-2
ISSN:1598-9623
2005-4149
DOI:10.1007/BF03027192