The study of the solution concentration influencing on laser-induced electrochemical etching silicon

• Published in: Optics and laser technology Vol. 43; no. 4; pp. 899 - 903
• Main Authors: Long, Yuhong, Xiong, Liangcai, Shi, Tielin
• Format: Journal Article
• Language: English
• Published: Elsevier Ltd 01.06.2011
• Subjects: Electrochemical etching; Electrolytes; Etching; Excimer laser; Excimer lasers; Lasers; Light sources; Micromachining; Silicon; Solution concentration; Excimer laser; Etching; Solution concentration
• ISSN: 0030-3992; 1879-2545
• DOI: 10.1016/j.optlastec.2010.10.001

The laser electrochemical etching process, which combines the laser direct etching process and the electrochemical etching process, is a compound etching technique. In order to further understand the solution concentration influencing on the laser-induced electrochemical etching of silicon; a 248 nm excimer laser as a light source and KOH solution as an electrolyte were adopted in this study. The experiments of micromachining silicon by laser-induced electrochemical etching were carried out. On the basis of the experiments results, the solution concentration influencing on the etching rates in the process of laser electrochemical etching of silicon was researched. The reasons of the etching phenomena were analyzed in detail. The experimental results indicate that the solution concentration influencing on the etching process is mainly rooted in the absorption of different concentration solutions to laser. In general, less absorption and low solution concentration are good for the etching role in the process of laser electrochemical etching.