A semi-quantitative model for the deposition rate in non-reactive high power pulsed magnetron sputtering

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 41; no. 21; p. 215301
Main Authors Sarakinos, K, Alami, J, Dukwen, J, Woerdenweber, J, Wuttig, M
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 07.11.2008
Institute of Physics
Subjects
Cross-disciplinary physics: materials science; rheology
Deposition by sputtering
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Yields
Cathode sputtering
Ionization
Deposition rate
Sputter deposition
Linear momentum
Implementation
Ion beams
Deposition process
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ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/41/21/215301