Thermal accommodation of a gas on a surface and heat transfer in CVD and PECVD experiments

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Bibliographic Details
Published inJournal of physics. D, Applied physics Vol. 30; no. 4; pp. 499 - 509
Main Authors Leroy, Olivier, Perrin, Jérôme, Jolly, Jacques, Péalat, Michel, Lefebvre, Michel
Format Journal Article
LanguageEnglish
Published Bristol IOP Publishing 21.02.1997
Institute of Physics
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Cross-disciplinary physics: materials science; rheology
Exact sciences and technology
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
CVD
Reactors
Thermal accommodation
Raman scattering
Temperature gradients
Surfaces
Crystal growth from vapors
PECVD
Experimental study
Antistokes lines
Heat transfer
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ISSN:0022-3727
1361-6463
DOI:10.1088/0022-3727/30/4/001