Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma

We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed th...

Full description

Saved in:
Bibliographic Details
Published inPlasma science & technology Vol. 18; no. 2; pp. 143 - 146
Main Author 王虹宇 姜巍 孙鹏 赵双云 李阳
Format Journal Article
LanguageEnglish
Published 01.02.2016
Subjects
Online AccessGet full text
ISSN1009-0630
DOI10.1088/1009-0630/18/2/08

Cover

Loading…
Abstract We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects.Some variation and potential application of the discharging configuration is discussed briefly.
AbstractList We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects.Some variation and potential application of the discharging configuration is discussed briefly.
We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged oppositely, and the discharging is perpendicularly driven by two radio frequency (RF) sources. Particle-in-cell/Monte Carlo (PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects. Some variation and potential application of the discharging configuration is discussed briefly.
Author 王虹宇 姜巍 孙鹏 赵双云 李阳
AuthorAffiliation School of Physics Science and Technology, Anshan Normal University, Anshan 114005,China School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China
Author_xml – sequence: 1
  fullname: 王虹宇 姜巍 孙鹏 赵双云 李阳
BookMark eNp9kD1PwzAQhj0UibbwA9giJpYQO05iZ0QtBaRWdIDZcv1RjFw7tROk_ntcterAwHTS3fuc7p4JGDnvFAB3CD4iSGmBIGxz2GBYIFqUBaQjML70rsEkxm8I66qleAxWKy-VNW6beZ2tVeiUk0YMlgd7yObB_CiXzQdu80VQ-0E5cchmvOPC9GmUIjM_dFbJbG153PEbcKW5jer2XKfgc_H8MXvNl-8vb7OnZS5w1fQ5ErUkUqoWQ4QkJkIjrCuIyYYSrbBodY24lvVGlFUpNRZCNhtNZSUo1EISPAUPp71d8Omq2LOdiUJZy53yQ2SIlnVVVxjhFCWnqAg-xqA0S7fz3njXB24sQ5AdpbGjIHYUlGBWMkgTif6QXTA7Hg7_Mvdn5su77T55vUBNQ9K_hJT4FzbTf34
CitedBy_id crossref_primary_10_1088_1361_6595_accd19
crossref_primary_10_1063_5_0152839
Cites_doi 10.1088/0963-0252/19/4/045012
10.1201/9781420012279
10.1088/0022-3727/39/20/014
10.1088/0963-0252/11/3/310
10.1088/0963-0252/22/6/065009
10.1088/0022-3727/42/2/025205
10.1088/0963-0252/13/3/016
10.1088/0963-0252/14/1/012
10.1063/1.3685709
10.1063/1.1534918
10.1002/0471724254
10.1109/TPS.2003.815471
10.1103/PhysRevLett.101.085004
10.1103/PhysRevLett.95.205001
10.1063/1.1592617
10.1063/1.2965118
10.1063/1.2425044
10.1063/1.1688334
10.1088/1742-6596/162/1/012010
10.1063/1.1604941
10.1088/0022-3727/46/23/235201
10.1016/j.nimb.2007.04.291
10.1063/1.3126718
10.1088/0963-0252/17/4/045002
ContentType Journal Article
DBID 2RA
92L
CQIGP
W92
~WA
AAYXX
CITATION
7U5
8FD
H8D
L7M
DOI 10.1088/1009-0630/18/2/08
DatabaseName 维普中文科技期刊数据库
中文科技期刊数据库-CALIS站点
中文科技期刊数据库-7.0平台
中文科技期刊数据库-工程技术
中文科技期刊数据库- 镜像站点
CrossRef
Solid State and Superconductivity Abstracts
Technology Research Database
Aerospace Database
Advanced Technologies Database with Aerospace
DatabaseTitle CrossRef
Aerospace Database
Solid State and Superconductivity Abstracts
Technology Research Database
Advanced Technologies Database with Aerospace
DatabaseTitleList
Aerospace Database
DeliveryMethod fulltext_linktorsrc
Discipline Physics
DocumentTitleAlternate Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
EndPage 146
ExternalDocumentID 10_1088_1009_0630_18_2_08
667930772
GroupedDBID 02O
042
123
1JI
1WK
2B.
2C.
2RA
4.4
5B3
5VR
5VS
5ZH
7.M
7.Q
92E
92I
92L
92Q
93N
AAGCD
AAJIO
AAJKP
AALHV
AATNI
ABHWH
ABQJV
ACAFW
ACGFS
ACHIP
AEFHF
AENEX
AFUIB
AFYNE
AHSEE
AKPSB
ALMA_UNASSIGNED_HOLDINGS
BBWZM
CCEZO
CCVFK
CEBXE
CHBEP
CJUJL
CQIGP
CRLBU
CS3
CW9
DU5
EBS
EDWGO
EJD
EMSAF
EPQRW
EQZZN
FA0
HAK
IJHAN
IOP
IZVLO
JCGBZ
KNG
KOT
LAP
M45
N5L
N9A
NS0
NT-
NT.
P2P
PJBAE
Q02
R4D
RIN
RNS
RO9
ROL
RPA
RW3
S3P
SY9
T37
TCJ
TGP
W28
W92
~WA
-SA
-S~
AAYXX
ACARI
ADEQX
AERVB
AGQPQ
AOAED
ARNYC
CAJEA
CITATION
Q--
U1G
U5K
7U5
8FD
AEINN
H8D
L7M
ID FETCH-LOGICAL-c346t-1c5d7dde93011d37cf13f4037b87fe3c9f51afd5bc242df3ccd6bf8d4c80fcd73
ISSN 1009-0630
IngestDate Wed Jul 30 11:30:04 EDT 2025
Thu Apr 24 23:12:42 EDT 2025
Tue Jul 01 03:44:31 EDT 2025
Wed Feb 14 10:22:11 EST 2024
IsPeerReviewed true
IsScholarly true
Issue 2
Language English
License http://iopscience.iop.org/info/page/text-and-data-mining
http://iopscience.iop.org/page/copyright
LinkModel OpenURL
MergedId FETCHMERGED-LOGICAL-c346t-1c5d7dde93011d37cf13f4037b87fe3c9f51afd5bc242df3ccd6bf8d4c80fcd73
Notes WANG Hongyu , JIANG Wei, SUN Peng, ZHAO Shuangyun , LI gang ( 1School of Physics Science and Technology, Anshan Normal University, Anshan 114005, China 2School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China)
CCP dual frequency coupling PIC/MC
We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects.Some variation and potential application of the discharging configuration is discussed briefly.
34-1187/TL
ObjectType-Article-1
SourceType-Scholarly Journals-1
ObjectType-Feature-2
content type line 23
PQID 1825454313
PQPubID 23500
PageCount 4
ParticipantIDs proquest_miscellaneous_1825454313
crossref_citationtrail_10_1088_1009_0630_18_2_08
crossref_primary_10_1088_1009_0630_18_2_08
chongqing_primary_667930772
ProviderPackageCode CITATION
AAYXX
PublicationCentury 2000
PublicationDate 2016-02-01
PublicationDateYYYYMMDD 2016-02-01
PublicationDate_xml – month: 02
  year: 2016
  text: 2016-02-01
  day: 01
PublicationDecade 2010
PublicationTitle Plasma science & technology
PublicationTitleAlternate Plasma Science & Technology
PublicationYear 2016
References Schulze J (16) 2011; 20
Donkó Z (23) 2009; 42
28
Boyle P C (4) 2004; 13
29
Lieberman M A (11) 2002; 11
Kawamura E (6) 2008; 17
Delattre P A (22) 2013; 46
10
12
Schmidt N (19) 2013; 46
13
14
Ohtsu Y (18) 2010; 19
17
Wang H Y (25) 2010; 19
Lee J K (15) 2005; 14
Makabe T (2) 2006
Kim G J (27) 2006; 39
Derzsi A (20) 2013; 22
1
3
5
7
Vizmuller P (24) 1996
8
9
Czarnetzki U (21) 2009; 162
Wang H Y (26) 2014; 23
References_xml – volume: 19
  issn: 0963-0252
  year: 2010
  ident: 18
  publication-title: Plasma Sources Sci. Technol.
  doi: 10.1088/0963-0252/19/4/045012
– year: 2006
  ident: 2
  publication-title: Plasma Electronics: Applications in Microelectronic Device Fabrication
  doi: 10.1201/9781420012279
– volume: 39
  start-page: 4386
  issn: 0022-3727
  year: 2006
  ident: 27
  publication-title: J. Phys. D: Appl. Phys.
  doi: 10.1088/0022-3727/39/20/014
– volume: 11
  start-page: 283
  issn: 0963-0252
  year: 2002
  ident: 11
  publication-title: Plasma Sources Sci. Technol.
  doi: 10.1088/0963-0252/11/3/310
– volume: 22
  issn: 0963-0252
  year: 2013
  ident: 20
  publication-title: Plasma Sources Sci. Technol.
  doi: 10.1088/0963-0252/22/6/065009
– volume: 42
  issn: 0022-3727
  year: 2009
  ident: 23
  publication-title: J. Phys. D: Appl. Phys.
  doi: 10.1088/0022-3727/42/2/025205
– volume: 13
  start-page: 493
  issn: 0963-0252
  year: 2004
  ident: 4
  publication-title: Plasma Sources Sci. Technol.
  doi: 10.1088/0963-0252/13/3/016
– volume: 14
  start-page: 89
  issn: 0963-0252
  year: 2005
  ident: 15
  publication-title: Plasma Sources Sci. Technol.
  doi: 10.1088/0963-0252/14/1/012
– ident: 29
  doi: 10.1063/1.3685709
– ident: 17
  doi: 10.1063/1.1534918
– volume: 46
  issn: 0022-3727
  year: 2013
  ident: 19
  publication-title: J. Phys. D: Appl. Phys.
– ident: 1
  doi: 10.1002/0471724254
– ident: 3
  doi: 10.1109/TPS.2003.815471
– volume: 20
  issn: 0963-0252
  year: 2011
  ident: 16
  publication-title: Plasma Sources Sci. Technol.
– ident: 7
  doi: 10.1103/PhysRevLett.101.085004
– ident: 12
  doi: 10.1103/PhysRevLett.95.205001
– volume: 19
  issn: 0963-0252
  year: 2010
  ident: 25
  publication-title: Plasma Sources Sci. Technol.
– ident: 9
  doi: 10.1063/1.1592617
– ident: 13
  doi: 10.1063/1.2965118
– ident: 14
  doi: 10.1063/1.2425044
– volume: 23
  issn: 1674-1056
  year: 2014
  ident: 26
  publication-title: Chin. Phys.
– year: 1996
  ident: 24
  publication-title: RF Design Guide - System, Circuits and Equations
– ident: 10
  doi: 10.1063/1.1688334
– volume: 162
  issn: 1742-6596
  year: 2009
  ident: 21
  publication-title: J. Phys. Conf. Ser.
  doi: 10.1088/1742-6596/162/1/012010
– ident: 8
  doi: 10.1063/1.1604941
– volume: 46
  issn: 0022-3727
  year: 2013
  ident: 22
  publication-title: J. Phys. D: Appl. Phys.
  doi: 10.1088/0022-3727/46/23/235201
– ident: 28
  doi: 10.1016/j.nimb.2007.04.291
– ident: 5
  doi: 10.1063/1.3126718
– volume: 17
  issn: 0963-0252
  year: 2008
  ident: 6
  publication-title: Plasma Sources Sci. Technol.
  doi: 10.1088/0963-0252/17/4/045002
SSID ssj0054983
Score 2.0086393
Snippet We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged...
We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged...
SourceID proquest
crossref
chongqing
SourceType Aggregation Database
Enrichment Source
Index Database
Publisher
StartPage 143
SubjectTerms Computer simulation
Coupling
Discharge
Electrodes
Joining
Monte Carlo methods
Particle in cell technique
Radio frequencies
分子组织
注射剂
等离子体
超声波
Title Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
URI http://lib.cqvip.com/qk/84262X/201602/667930772.html
https://www.proquest.com/docview/1825454313
Volume 18
hasFullText 1
inHoldings 1
isFullTextHit
isPrint
link http://utb.summon.serialssolutions.com/2.0.0/link/0/eLvHCXMwnR1db9Mw0CpDCF4Qn6IMUJDwC1FoXCf-eEzaRANp0IdN2lvUOMk0qWpH1z5sP4tfyJ3jZC2gCZCq9nS-OFbueh_x-Y6QD2xc2ubFQVzPIUAxQgcqKnlQCillpZVgJZ4dPv4qjk6jL2fx2WDwYydrabspP5mbP54r-R-uAg74iqdk_4Gz_aSAABj4C9_AYfj-Kx5jI7OFS1ue1WtsZ3th80oX1_50jXrMn27niyBftwnT8PcH22hsuhCWNV5tLxfgcM7Ag3bq2bmpNJM0mVKlLSBomtIsRowOaRbRFABuhyTVzA0BGQ4pqjKaCaoSTKIAQE9oktMsp-mE6oRmQJDSlNkhIJM4D9xI9Tm1FpEhFdBqTVNt7wAY6VtI4pwApEA39buVAZWlVbmPF6YxfmBM5VRN7NISWKxv7zu1i9RUAx3fffHB-lzpXlfbfR3htnUudqLoVheztv6TM-vuTedvFgO0rH154eZCGBFYljZUt0ayT10UAjRaCDHJPXJ_DD_YLuTzt1ln_SHcVu2hDjdht5Ou1KjHjZgajUfY0fQh2Ljl-XeQlH2_aN8tsL7OyRPy2AUpXtJK3FMyqJfPyAObLGyunpPjTu68VeP9IndeK3fevtx5u3LnObnzWrl7QU7z7GRyFLi2HIHhkdgEzMSVBKuo0TZUXJqG8SYKuSyVbGpudBOzeVPFpQH3r2q4MZUoG1VFRoWNqSR_SQ6Wq2X9inhNOI_CGoJicMOjUmCleCOAshJxHZpSDslh_4CKy7b8StFzYEjC7pEVxlW0x8Yqi8JmViiFBbl1gU-8YKoYF6Eako_9Jd18dxC_7_hQgNLFnbT5sl5tr4BgDJEH-N789Z0rPCSPbiX3DTnYrLf1W3BiN-U7KzU_Ad9DeyA
linkProvider IOP Publishing
openUrl ctx_ver=Z39.88-2004&ctx_enc=info%3Aofi%2Fenc%3AUTF-8&rfr_id=info%3Asid%2Fsummon.serialssolutions.com&rft_val_fmt=info%3Aofi%2Ffmt%3Akev%3Amtx%3Ajournal&rft.genre=article&rft.atitle=Modeling+of+Perpendicularly+Driven+Dual-Frequency+Capacitively+Coupled+Plasma&rft.jtitle=%E7%AD%89%E7%A6%BB%E5%AD%90%E4%BD%93%E7%A7%91%E5%AD%A6%E4%B8%8E%E6%8A%80%E6%9C%AF%EF%BC%9A%E8%8B%B1%E6%96%87%E7%89%88&rft.au=%E7%8E%8B%E8%99%B9%E5%AE%87+%E5%A7%9C%E5%B7%8D+%E5%AD%99%E9%B9%8F+%E8%B5%B5%E5%8F%8C%E4%BA%91+%E6%9D%8E%E9%98%B3&rft.date=2016-02-01&rft.issn=1009-0630&rft.issue=2&rft.spage=143&rft.epage=146&rft_id=info:doi/10.1088%2F1009-0630%2F18%2F2%2F08&rft.externalDocID=667930772
thumbnail_s http://utb.summon.serialssolutions.com/2.0.0/image/custom?url=http%3A%2F%2Fimage.cqvip.com%2Fvip1000%2Fqk%2F84262X%2F84262X.jpg