Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma
We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed th...
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Published in | Plasma science & technology Vol. 18; no. 2; pp. 143 - 146 |
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Main Author | |
Format | Journal Article |
Language | English |
Published |
01.02.2016
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Online Access | Get full text |
ISSN | 1009-0630 |
DOI | 10.1088/1009-0630/18/2/08 |
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Abstract | We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects.Some variation and potential application of the discharging configuration is discussed briefly. |
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AbstractList | We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects.Some variation and potential application of the discharging configuration is discussed briefly. We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged oppositely, and the discharging is perpendicularly driven by two radio frequency (RF) sources. Particle-in-cell/Monte Carlo (PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects. Some variation and potential application of the discharging configuration is discussed briefly. |
Author | 王虹宇 姜巍 孙鹏 赵双云 李阳 |
AuthorAffiliation | School of Physics Science and Technology, Anshan Normal University, Anshan 114005,China School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China |
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Notes | WANG Hongyu , JIANG Wei, SUN Peng, ZHAO Shuangyun , LI gang ( 1School of Physics Science and Technology, Anshan Normal University, Anshan 114005, China 2School of Physics, Huazhong University of Science and Technology, Wuhan 430074, China) CCP dual frequency coupling PIC/MC We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged oppositely,and the discharging is perpendicularly driven by two radio frequency(RF) sources.Particle-in-cell/Monte Carlo(PIC/MC) simulation showed that the configuration had some advantages as this configuration eliminated some dual frequency coupling effects.Some variation and potential application of the discharging configuration is discussed briefly. 34-1187/TL ObjectType-Article-1 SourceType-Scholarly Journals-1 ObjectType-Feature-2 content type line 23 |
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References | Schulze J (16) 2011; 20 Donkó Z (23) 2009; 42 28 Boyle P C (4) 2004; 13 29 Lieberman M A (11) 2002; 11 Kawamura E (6) 2008; 17 Delattre P A (22) 2013; 46 10 12 Schmidt N (19) 2013; 46 13 14 Ohtsu Y (18) 2010; 19 17 Wang H Y (25) 2010; 19 Lee J K (15) 2005; 14 Makabe T (2) 2006 Kim G J (27) 2006; 39 Derzsi A (20) 2013; 22 1 3 5 7 Vizmuller P (24) 1996 8 9 Czarnetzki U (21) 2009; 162 Wang H Y (26) 2014; 23 |
References_xml | – volume: 19 issn: 0963-0252 year: 2010 ident: 18 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/19/4/045012 – year: 2006 ident: 2 publication-title: Plasma Electronics: Applications in Microelectronic Device Fabrication doi: 10.1201/9781420012279 – volume: 39 start-page: 4386 issn: 0022-3727 year: 2006 ident: 27 publication-title: J. Phys. D: Appl. Phys. doi: 10.1088/0022-3727/39/20/014 – volume: 11 start-page: 283 issn: 0963-0252 year: 2002 ident: 11 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/11/3/310 – volume: 22 issn: 0963-0252 year: 2013 ident: 20 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/22/6/065009 – volume: 42 issn: 0022-3727 year: 2009 ident: 23 publication-title: J. Phys. D: Appl. Phys. doi: 10.1088/0022-3727/42/2/025205 – volume: 13 start-page: 493 issn: 0963-0252 year: 2004 ident: 4 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/13/3/016 – volume: 14 start-page: 89 issn: 0963-0252 year: 2005 ident: 15 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/14/1/012 – ident: 29 doi: 10.1063/1.3685709 – ident: 17 doi: 10.1063/1.1534918 – volume: 46 issn: 0022-3727 year: 2013 ident: 19 publication-title: J. Phys. D: Appl. Phys. – ident: 1 doi: 10.1002/0471724254 – ident: 3 doi: 10.1109/TPS.2003.815471 – volume: 20 issn: 0963-0252 year: 2011 ident: 16 publication-title: Plasma Sources Sci. Technol. – ident: 7 doi: 10.1103/PhysRevLett.101.085004 – ident: 12 doi: 10.1103/PhysRevLett.95.205001 – volume: 19 issn: 0963-0252 year: 2010 ident: 25 publication-title: Plasma Sources Sci. Technol. – ident: 9 doi: 10.1063/1.1592617 – ident: 13 doi: 10.1063/1.2965118 – ident: 14 doi: 10.1063/1.2425044 – volume: 23 issn: 1674-1056 year: 2014 ident: 26 publication-title: Chin. Phys. – year: 1996 ident: 24 publication-title: RF Design Guide - System, Circuits and Equations – ident: 10 doi: 10.1063/1.1688334 – volume: 162 issn: 1742-6596 year: 2009 ident: 21 publication-title: J. Phys. Conf. Ser. doi: 10.1088/1742-6596/162/1/012010 – ident: 8 doi: 10.1063/1.1604941 – volume: 46 issn: 0022-3727 year: 2013 ident: 22 publication-title: J. Phys. D: Appl. Phys. doi: 10.1088/0022-3727/46/23/235201 – ident: 28 doi: 10.1016/j.nimb.2007.04.291 – ident: 5 doi: 10.1063/1.3126718 – volume: 17 issn: 0963-0252 year: 2008 ident: 6 publication-title: Plasma Sources Sci. Technol. doi: 10.1088/0963-0252/17/4/045002 |
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Snippet | We analyzed perpendicularly configured dual-frequency(DF) capacitively coupled plasmas(CCP).In this configuration,two pairs of electrodes are arranged... We analyzed perpendicularly configured dual-frequency (DF) capacitively coupled plasmas (CCP). In this configuration, two pairs of electrodes are arranged... |
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SubjectTerms | Computer simulation Coupling Discharge Electrodes Joining Monte Carlo methods Particle in cell technique Radio frequencies 分子组织 注射剂 等离子体 超声波 |
Title | Modeling of Perpendicularly Driven Dual-Frequency Capacitively Coupled Plasma |
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