Hard x-ray photoelectron spectroscopy study of copper formation by metal salt inclusion in a polymer film

• Published in: Journal of physics. D, Applied physics Vol. 52; no. 43; pp. 435301 - 435309
• Main Authors: Snelgrove, M, Mani-Gonzalez, P G, Bogan, J, Lundy, R, Rueff, J-P, Hughes, G, Yadav, P, McGlynn, E, Morris, M, O'Connor, R
• Format: Journal Article
• Language: English
• Published: IOP Publishing 23.10.2019
• Subjects: area selective deposition; Condensed Matter; HAXPES; Metal Salt; P2VP; Physics; polymer infiltration; Strongly Correlated Electrons
• ISSN: 0022-3727; 1361-6463
• DOI: 10.1088/1361-6463/ab35b2

In this work we present the results of a hard x-ray photoelectron spectroscopy (HAXPES) study on the creation of metallic copper layers via metal-salt infiltration into a poly-2-vinylpyridine (P2VP) film. Metal salt inclusion is a wet chemistry process which allows for the fabrication of both metal and metal oxide films by means of infiltrating a receptive polymer thin film with metal salt precursors. A copper infiltrated P2VP film was subject to UV/Ozone treatment to form copper oxide and annealed in-vacuo to reduce the film to metallic copper. HAXPES and transmission electron microscope measurements were used to study the polymer film before and after metal salt infiltration, along with analysis of the copper oxide created after UV/Ozone treatment. The results show successful infiltration of the metal salt into the polymer film, as well as complete conversion to copper oxide following UV/Ozone treatment and reduction to metallic copper with a subsequent in situ anneal, which demonstrates the ability of the technique for the creation of several key integrated circuit features.