Physical optics modeling in soft-x-ray projection lithography
We develop a diffraction-based tool that can predict the image quality in projection lithography systems. The effects of partial coherence and source variations and imaging defects in both the condenser and the camera optics can all be determined.
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| Published in | Applied optics (2004) Vol. 32; no. 34; p. 6945 |
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| Main Authors | , |
| Format | Journal Article |
| Language | English |
| Published |
United States
01.12.1993
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| Online Access | Get more information |
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| Summary: | We develop a diffraction-based tool that can predict the image quality in projection lithography systems. The effects of partial coherence and source variations and imaging defects in both the condenser and the camera optics can all be determined. |
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| ISSN: | 1559-128X |
| DOI: | 10.1364/AO.32.006945 |