Adhesion at the Ta(Mo)/NiTi Interface

The atomic and electronic structures of Me (110)/NiTi(110) and TiO 2 (100)/ Me (110) interfaces (where Me = Ta, Mo) have been studied by the projector augmented-wave method in the framework of the density functional theory. It is established that the formation of intermediate oxide layers at the met...

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Bibliographic Details
Published inTechnical physics letters Vol. 45; no. 6; pp. 620 - 624
Main Authors Bakulin, A. V., Kulkova, S. E.
Format Journal Article
LanguageEnglish
Published Moscow Pleiades Publishing 01.06.2019
Springer Nature B.V
Subjects
ADHESION
Classical and Continuum Physics
CONDENSED MATTER PHYSICS, SUPERCONDUCTIVITY AND SUPERFLUIDITY
DENSITY FUNCTIONAL METHOD
Density functional theory
ELECTRONIC STRUCTURE
INTERFACES
Intermetallic compounds
MOLYBDENUM
NICKEL COMPOUNDS
Nickel titanides
Physics
Physics and Astronomy
TANTALUM
TITANATES
Titanium dioxide
TITANIUM OXIDES
interface
NiTi
adhesion
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Summary:The atomic and electronic structures of Me (110)/NiTi(110) and TiO 2 (100)/ Me (110) interfaces (where Me = Ta, Mo) have been studied by the projector augmented-wave method in the framework of the density functional theory. It is established that the formation of intermediate oxide layers at the metal–oxide interface can lead to decreased adhesion at the interface.
ISSN:1063-7850
1090-6533
DOI:10.1134/S1063785019060208