Vapor–liquid–solid growth of silicon nanowires from surface nanoholes formed with metal-assisted chemical etching

• Published in: Japanese Journal of Applied Physics Vol. 60; no. 5; pp. 55502 - 55507
• Main Authors: Uesugi, Akio, Horita, Taiju, Sugano, Koji, Isono, Yoshitada
• Format: Journal Article
• Language: English
• Published: Tokyo IOP Publishing 01.05.2021; Japanese Journal of Applied Physics
• Subjects: Chemical etching; Gold; Metal-assisted chemical etching; Nanoparticles; Nanowires; Silicon; Silicon nanowire; Vapor–liquid–solid process
• ISSN: 0021-4922; 1347-4065
• DOI: 10.35848/1347-4065/abf22d

Abstract The influence of shallow surface nanoholes on the growth direction of silicon nanowires (SiNWs) with the vapor–liquid–solid (VLS) process was studied in order to realize a single-step way to promote integration of high-density SiNWs along a specific direction. Shallow surface nanoholes were formed by the short-time metal-assisted chemical etching (MACE) process with catalytic Au nanoparticles of 60 nm also used for the VLS process, in order to shape nanoholes with a similar diameter to the nanoparticles. With an increase in MACE processing time to 5 min, the ratio of perpendicularly grown SiNWs to the SiNWs that appeared on the (111) silicon surface significantly increased in the initial growth phase, reaching higher than 80%. This ratio was more than 3 times higher than without the MACE process. On the other hand, the excess processing time brought about a decrease of the SiNWs detected. This result indicated that the formation of surface nanoholes with an appropriate depth could be an effective way of controlling SiNW growth direction.