Growth of a textured quasicrystalline phase in Ti-Ni-Zr films prepared by pulsed laser deposition

The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by pulsed laser deposition on sapphire substrates at temperatures ranging from room temperature to 350 C. Morphological and stru...

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Published inApplied physics. A, Materials science & processing Vol. 76; no. 2; pp. 187 - 195
Main Authors Brien, V., Dauscher, A., Weisbecker, P., Machizaud, F.
Format Journal Article
LanguageEnglish
Published Springer Verlag 01.02.2003
Subjects
Alloys
Chemical Sciences
Condensed Matter
Deposition
Diffraction
Inorganic chemistry
Mass spectroscopy
Material chemistry
Materials Science
Nanocrystals
Optics
Physics
Pulsed laser deposition
Thin films
Titanium
Thin film: 6855a
Pulsed laser deposition: 8115 Fg
Quasicrystals 6855 Nq
Texture: 6855Jk
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Summary:The preparation in thin film form of the known icosahedral phase in Ti-Ni-Zr bulk alloys has been investigated as a function of substrate temperature. Films were deposited by pulsed laser deposition on sapphire substrates at temperatures ranging from room temperature to 350 C. Morphological and structural modifications have been followed by grazing-incidence and *c--2*c X-ray diffraction, transmission electron diffraction and imaging. Chemical composition has been analyzed by electron probe microanalysis. The in-depth variation of composition has been studied by secondary neutral mass spectroscopy. We show that pulsed laser deposition at 275 C makes the formation of a 1-*mm-thick film of Ti-Ni-Zr quasicrystalline textured nanocrystallites possible.
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0947-8396
1432-0630
DOI:10.1007/s003390201405