Magnetic properties of nanostructure controlled FeAlSi/FeAlSiO multilayers

FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability...

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Bibliographic Details
Published inIEEE transactions on magnetics Vol. 30; no. 6; pp. 4884 - 4886
Main Authors Hiramoto, M., Inoue, O., Kugimiya, K.
Format Journal Article
LanguageEnglish
Published IEEE 01.11.1994
Subjects
Annealing
Diffraction
Magnetic films
Magnetic multilayers
Magnetic properties
Nonhomogeneous media
Plasma measurements
Soft magnetic materials
Sputtering
Thermal stability
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Summary:FeAlSi/FeAlSiO multilayers prepared by the pulse reactive sputtering were investigated. It was found that the layered structure had a high thermal stability over the ordering temperature of FeAlSi. In consequence, a saturation magnetic flux density of 1.4-1.5 T, a high isotropic initial permeability of 2000-10000 at 1 MHz were obtained even after the thermal annealing above 500/spl deg/C.< >
Bibliography:ObjectType-Article-2
SourceType-Scholarly Journals-1
ObjectType-Feature-1
content type line 23
ISSN:0018-9464
1941-0069
DOI:10.1109/20.334254