Field-emission characteristics of diamond-like amorphous carbon films deposited by mixed gas (N2 or H2) controlled i-C4H10 supermagnetron plasma

• Published in: Thin solid films Vol. 515; no. 12; pp. 5142 - 5146
• Main Authors: KINOSHITA, Haruhisa, YAMASHITA, Manabu
• Format: Conference Proceeding Journal Article
• Language: English
• Published: Lausanne Elsevier Science 23.04.2007
• Subjects: Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.); Condensed matter: electronic structure, electrical, magnetic, and optical properties; Cross-disciplinary physics: materials science; rheology; Electron and ion emission by liquids and solids; impact phenomena; Exact sciences and technology; Field emission, ionization, evaporation, and desorption; Fullerenes and related materials; diamonds, graphite; Materials science; Methods of deposition of films and coatings; film growth and epitaxy; Physics; Specific materials; Thin films; CVD; Plasma applications; Amorphous thin film; Double bonds; Supermagnetron plasma; Electric field effects; Diamond-like carbon; Field emission; Diamond-like amorphous carbon; Chemical vapor deposition