Field-emission characteristics of diamond-like amorphous carbon films deposited by mixed gas (N2 or H2) controlled i-C4H10 supermagnetron plasma

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Bibliographic Details
Published inThin solid films Vol. 515; no. 12; pp. 5142 - 5146
Main Authors KINOSHITA, Haruhisa, YAMASHITA, Manabu
Format Conference Proceeding Journal Article
LanguageEnglish
Published Lausanne Elsevier Science 23.04.2007
Subjects
Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.)
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Cross-disciplinary physics: materials science; rheology
Electron and ion emission by liquids and solids; impact phenomena
Exact sciences and technology
Field emission, ionization, evaporation, and desorption
Fullerenes and related materials; diamonds, graphite
Materials science
Methods of deposition of films and coatings; film growth and epitaxy
Physics
Specific materials
Thin films
CVD
Plasma applications
Amorphous thin film
Double bonds
Supermagnetron plasma
Electric field effects
Diamond-like carbon
Field emission
Diamond-like amorphous carbon
Chemical vapor deposition
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ISSN:0040-6090
1879-2731
DOI:10.1016/j.tsf.2006.10.055