Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching
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| Published in | Microsystem technologies Vol. 13; no. 8-10; pp. 1411 - 1416 |
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| Main Authors | , , , , |
| Format | Conference Proceeding Journal Article |
| Language | English |
| Published |
Berlin
Springer
01.05.2007
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| Subjects | |
| Online Access | Get full text |
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| Author | SHIMANO, Takeshi NAKAMURA, Shigeo KANAMORI, Yoshiaki SATO, Junya HANE, Kazuhiro |
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| Cites_doi | 10.1063/1.1690876 10.1364/AO.27.001281 10.1299/jsmec.46.1598 10.1007/s003390100934 10.1063/1.112818 10.1116/1.1624272 10.1117/1.1805563 10.1109/SENSOR.2005.1497272 |
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| Keywords | Great depth Reactive ion etching Silicon Lithography High aspect ratio microstructure HARM Nanotechnology |
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| References | C Du (380_CR2) 2004; 43 M Miwa (380_CR5) 2001; 73 N Sato (380_CR7) 1994; 65 G Wang (380_CR9) 2003; 46 HW Choi (380_CR1) 2004; 84 380_CR3 L Li (380_CR4) 2003; B21 ZD Popovic (380_CR6) 1988; 27 LA Tse (380_CR8) 2003; 9 |
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| SubjectTerms | Applied sciences Electronics Exact sciences and technology Instruments, apparatus, components and techniques common to several branches of physics and astronomy Mechanical engineering. Machine design Mechanical instruments, equipment and techniques Microelectronic fabrication (materials and surfaces technology) Micromechanical devices and systems Physics Precision engineering, watch making Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices |
| Title | Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching |
| Volume | 13 |
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