Polymer microstructure generated by laser stereo-lithography and its transfer to silicon substrate using reactive ion etching

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Bibliographic Details
Published inMicrosystem technologies Vol. 13; no. 8-10; pp. 1411 - 1416
Main Authors KANAMORI, Yoshiaki, SATO, Junya, SHIMANO, Takeshi, NAKAMURA, Shigeo, HANE, Kazuhiro
Format Conference Proceeding Journal Article
LanguageEnglish
Published Berlin Springer 01.05.2007
Subjects
Applied sciences
Electronics
Exact sciences and technology
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Mechanical engineering. Machine design
Mechanical instruments, equipment and techniques
Microelectronic fabrication (materials and surfaces technology)
Micromechanical devices and systems
Physics
Precision engineering, watch making
Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
Great depth
Reactive ion etching
Silicon
Lithography
High aspect ratio microstructure HARM
Nanotechnology
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ISSN:0946-7076
1432-1858
DOI:10.1007/s00542-007-0380-7